Infinity FA Delivers More Flexibility for Advanced Failure Analysis

As semiconductor devices become more complex, failure analysis requires delayering processes that provide precise material removal, maintain planarity across mixed-material structures, and minimize sample damage. In this video, Denton Vacuum discusses the latest enhancements to the Infinity FA Whole Chip Delayering System, including a redesigned, standardized platform, expanded ion source options, Versa cluster tool integration, and integrated Secondary Ion Mass Spectrometry (SIMS) for precise endpoint control. Learn how the Infinity FA supports advanced semiconductor failure analysis through:• Whole-chip delayering with broad ion beam etching• Precise endpoint detection using SIMS• Low-damage material removal for advanced device structures• Flexible system configurations for a range of applications• Integration with Denton's Versa cluster platform Learn more about the Infinity FA:https://www.dentonvacuum.com/products...