Electron Beam Lithography with NPGS Tutorial (Qubit Gate Layer)

Demo of electron beam lithography process using NPGS (Nanometer Pattern Generation System - written by Joseph Nabity) for fabrication of silicon qubit. 0:04 Loading The Sample 3:08 Tuning Up SEM 12:17 Preparing to Write - Navigating to Chip, Fine Tuning 18:35 Writing 30:00 Shutdown Procedure Alignment process: 1. Align to large alignment marks at low mag 2. Align to medium alignment marks at medium mag - include known systematic offset between medium/high mag 3. Auto align procedure for fine alignment marks: 3.1 Immediately press "b" to blank beam after all marks are scanned 1 time 3.2 Press "a" to auto-adjust brightness contrast colorbar 3.3 Press "!" to engage auto-alignment of marks 3.4 Press "r" to align to marks - the beam will begin scanning the marks after this again 3.5 Immediately press "b" to blank the beam after all the marks are scanned for the second time 3.6 Quickly press "!" to perform the final auto-alignment 3.7 As soon as the auto-alignment finishes, press "Enter" and then "y" to begin writing Keystroke pattern summary for fine alignment: *scan marks*, "b, a, !, r," *scan marks*, "b, !, Enter, y" *All keys are on NPGS keyboard. Filmed and edited by Elliot Connors (econnors@ur.rochester.edu) as a member of the Nichol Group at University of Rochester.